Postdoc : Generating extreme ultraviolet light from plasma with a 2μm laser

ph3Postdoc : Generating extreme ultraviolet light from plasma with a 2µm laser /h3 pThis experiment-oriented postdoctoral position lies at the interface between fundamental physics and industrial application. It is part of activities in ARCNL's Source Department. The research activities of the Source Department and itsEUV Plasma Processes group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography. /p pIn our group's research we, for example, uncovered the quantum origins of the generated EUV light (Torretti, Nature Comms. Nature Commun. b11 /b, (2020)), found a universal law for expanding plasma (Sheil, Phys. Rev. Lett. b133 /b, (2024)), and found that less than half the initial droplet volume is present on thin tin sheet targets as used in EUV sources (Liu, Phys. Rev. Appl. b20 /b, (2023)), and work on an alternative EUV source solution (Mostafa, Appl. Phys. Lett. b123 /b, (2023)) – a concept that is most relevant for the current vacancy. /p pbBackground /b /p pThe revolutionary introduction of EUV lithography was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. The short, 13.5-nm EUV wavelength enables patterning the smallest, smartest, and most energy-efficient features on chips. The required 13.5-nm radiation is generated from plasma that is produced from tiny tin droplets that are heated by powerful laser pulses. At ARCNL, we are now thinking about the next generation of light sources: Can we make more energy efficient and more powerful EUV light sources? /p pbProject goal /b /p pTo identify what light source will power the next generation of lithography machines, we need to understand what plasma conditions are optimal for producing light from plasma, but also we need to understand how such plasma should be generated, and what laser technology should be used. You will join an interdisciplinary team of several PhD students and postdocs in ARCNL's highly cohesive Source Department and have as an objective to design execute experiments, and work with advanced laser technologies, to understand the emission of light and ions from plasma that you generate. /p h3Qualifications /h3 ul liYou have (or will soon obtain) a PhD in (Applied) Physics. /li liKnowledge of experimental laser and/or plasma physics is an asset, especially if combined with strong hands-on laboratory skills. /li liProgramming experience, particularly in Python, is welcomed. /li liStrong verbal and written communication skills in English are required. /li /ul h3Work environment /h3 pThe Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), the University of Groningen (UG), and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has a size of approximately 100 scientists and support staff. See also /p h3Working conditions /h3 pThe position is intended as full-time (40 hrs / week, 12 months / year) appointment in the service of the Netherlands Foundation for Scientific Research Institutes (NWO-I ) for the duration of up to 3 years, with a starting salary of €4,552 gross per month, scale 10 (CAO-OI ), and a range of employment benefits . A favorable tax agreement, the '30% ruling', may apply to non-Dutch applicants. ARCNL assists any new foreign researchers with housing, subject to availability, and visa applications and compensates their transport costs and furnishing expenses. /p h3More information? /h3 pFor further information about the position, please contact: /p pDr. Oscar Versolatobr/Group leader EUV Plasma Processesbr/E-mail: br/Phone: +31 (0) /p h3Diversity code /h3 pARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability. /p pbCommercial activities in response to this ad are not appreciated. /b /p /p #J-18808-Ljbffr